Design and fabrication stable LNF contact for future IC application

Enable the design of a small contact spring for applications requiring high density, high speed and high durability. A low normal force (LNF) contact spring with high performance is fabricated using a unique combined MEMS photo resist lithography and electro fine forming (EFF) technology. Reducing a...

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Bibliographic Details

Main Authors:	Bhuiyan, Moinul, Rashid, Muhammad Mahbubur, Ahmed, Sayem, Bhuiyan, Munira, Kajihara, Masanori
Format:	Article
Language:	en
Published:	IOP Publishing 2013
Subjects:	TA174 Engineering design
Online Access:	http://irep.iium.edu.my/34439/1/Design_and_fabrication_stable_LNF_contact_for_future_IC_application.pdf http://irep.iium.edu.my/34439/ http://iopscience.iop.org/1757-899X/53/1/012060
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