Chemical mechanical polishing as an alternative surface treatment technique for corrosion prevention of carbon steel in an acidic medium

Chemical mechanical polishing (CMP) has been a standard technique in semiconductor manufacturing for achieving smooth surfaces. CMP utilizes a synergistic interplay of chemical and mechanical interactions to achieve the desired removal rates, selectivity, and ultimately planarity with different s...

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Bibliographic Details

Main Authors:	Ahmed, Mohamed, Al-Timimi, Buthainah Ali, Al-Ali, Maha, H. Abdullah, Ghassan, Atiyaha, Safa Khalaf, Aljanabi, Ahmed Yaseen Ali, Mel, Maizirwan
Format:	Article
Language:	en en
Published:	New Age - Media New Age Limited 2025
Subjects:	TP155 Chemical engineering
Online Access:	http://irep.iium.edu.my/123311/2/123311_Chemical%20mechanical%20polishing.pdf http://irep.iium.edu.my/123311/3/123311_Scopus.pdf http://irep.iium.edu.my/123311/ https://www.nature.com/articles/s41598-025-98210-w
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