Search Results - R. Aarif

Effect of HNO3 Concentration on Etch Rate and Structure of Si Wafer Etched in the Mixture of HF and HNO3 Solutions by F. Nurhaziqah K, C. K. Sheng, K. A. M. Amin, M. I. N. Isa, M. F. Hassan, E. A. G. E. Ali, K. H. Kamarudin, R. Aarif