Mat Sharif, K. A. (2013). Effect of GeCl4/SiCl4 flow ratio on germanium incorporation in MCVD process. IEEE.
Chicago Style CitationMat Sharif, Khairul Anuar. Effect of GeCl4/SiCl4 Flow Ratio On Germanium Incorporation in MCVD Process. IEEE, 2013.
MLA引文Mat Sharif, Khairul Anuar. Effect of GeCl4/SiCl4 Flow Ratio On Germanium Incorporation in MCVD Process. IEEE, 2013.
警告:这些引文格式不一定是100%准确.