F., S., & 36239165300. (2023). Characterization and optimizations of silicide thickness in 45nm pMOS device.
استشهاد بنمط شيكاغوF., Salehuddin, and 36239165300. Characterization and Optimizations of Silicide Thickness in 45nm PMOS Device. 2023.
MLA استشهادF., Salehuddin, and 36239165300. Characterization and Optimizations of Silicide Thickness in 45nm PMOS Device. 2023.
تحذير: قد لا تكون هذه الاستشهادات دائما دقيقة بنسبة 100%.