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Pattern designed for combination of optical lithography and electron beam lithography

Malaysian Technical Universities Conference on Engineering and Technology organized by Universiti Malaysia Pahang in collaboration with Universiti Tun Hussein Onn Malaysia, Universiti Teknikal Malaysia Melaka & Universiti Malaysia Perlis on June 20th - 22nd, 2009, at MS Garden Hotel, Kuantan, P...

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Main Authors: S. Fatimah, Abd Rahman, Uda, Hashim, Prof. Dr., Mohammad Nuzaihan, Md Nor, A. M., Mohamed Nuri, Muhamad Emi Azri, Shohini
格式: Working Paper
語言:English
出版: Universiti Malaysia Pahang 2010
主題:
Electron beam lithogrphy
Optical lithography
Nanowire
Silicon on insulator (SOI)
Malaysian Technical Universities Conference on Engineering and Technology (MUCEET)
在線閱讀:http://dspace.unimap.edu.my/xmlui/handle/123456789/8821
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總結:Malaysian Technical Universities Conference on Engineering and Technology organized by Universiti Malaysia Pahang in collaboration with Universiti Tun Hussein Onn Malaysia, Universiti Teknikal Malaysia Melaka & Universiti Malaysia Perlis on June 20th - 22nd, 2009, at MS Garden Hotel, Kuantan, Pahang, Malaysia.

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