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Pattern designed for combination of optical lithography and electron beam lithography

Malaysian Technical Universities Conference on Engineering and Technology organized by Universiti Malaysia Pahang in collaboration with Universiti Tun Hussein Onn Malaysia, Universiti Teknikal Malaysia Melaka & Universiti Malaysia Perlis on June 20th - 22nd, 2009, at MS Garden Hotel, Kuantan, P...

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主要な著者: S. Fatimah, Abd Rahman, Uda, Hashim, Prof. Dr., Mohammad Nuzaihan, Md Nor, A. M., Mohamed Nuri, Muhamad Emi Azri, Shohini
フォーマット: Working Paper
言語:English
出版事項: Universiti Malaysia Pahang 2010
主題:
Electron beam lithogrphy
Optical lithography
Nanowire
Silicon on insulator (SOI)
Malaysian Technical Universities Conference on Engineering and Technology (MUCEET)
オンライン･アクセス:http://dspace.unimap.edu.my/xmlui/handle/123456789/8821
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その他の書誌記述
要約:Malaysian Technical Universities Conference on Engineering and Technology organized by Universiti Malaysia Pahang in collaboration with Universiti Tun Hussein Onn Malaysia, Universiti Teknikal Malaysia Melaka & Universiti Malaysia Perlis on June 20th - 22nd, 2009, at MS Garden Hotel, Kuantan, Pahang, Malaysia.

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