صورة الغلاف

Pattern designed for combination of optical lithography and electron beam lithography

Malaysian Technical Universities Conference on Engineering and Technology organized by Universiti Malaysia Pahang in collaboration with Universiti Tun Hussein Onn Malaysia, Universiti Teknikal Malaysia Melaka & Universiti Malaysia Perlis on June 20th - 22nd, 2009, at MS Garden Hotel, Kuantan, P...

وصف كامل

محفوظ في:
التفاصيل البيبلوغرافية
المؤلفون الرئيسيون: S. Fatimah, Abd Rahman, Uda, Hashim, Prof. Dr., Mohammad Nuzaihan, Md Nor, A. M., Mohamed Nuri, Muhamad Emi Azri, Shohini
التنسيق: Working Paper
اللغة:English
منشور في: Universiti Malaysia Pahang 2010
الموضوعات:
Electron beam lithogrphy
Optical lithography
Nanowire
Silicon on insulator (SOI)
Malaysian Technical Universities Conference on Engineering and Technology (MUCEET)
الوصول للمادة أونلاين:http://dspace.unimap.edu.my/xmlui/handle/123456789/8821
الوسوم: إضافة وسم
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الوصف
الملخص:Malaysian Technical Universities Conference on Engineering and Technology organized by Universiti Malaysia Pahang in collaboration with Universiti Tun Hussein Onn Malaysia, Universiti Teknikal Malaysia Melaka & Universiti Malaysia Perlis on June 20th - 22nd, 2009, at MS Garden Hotel, Kuantan, Pahang, Malaysia.

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