Nanowire formation for single electron transistor using SEM based Electron Beam Lithography (EBL) technique: Positive tone vs negative tone e-beam resist

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Main Authors: Mohammad Nuzaihan, Md Nor, Uda, Hashim, Nur Hamidah, Abdul Halim, Bajuri, S. N M
格式: Article
语言:English
出版: Nano Science and Technology Institute 2009
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在线阅读:http://dspace.unimap.edu.my/xmlui/handle/123456789/6977
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