Hanizam, H., & hanizam@utem.edu.my. (2013). The effect of pulse DC and DC substrate bias during in situ cleaning PVD process on surface roughness. Malaysian Technical Universities Network (MTUN).
Chicago Style CitationHanizam, Hashim, and hanizam@utem.edu.my. The Effect of Pulse DC and DC Substrate Bias During in Situ Cleaning PVD Process On Surface Roughness. Malaysian Technical Universities Network (MTUN), 2013.
MLA引文Hanizam, Hashim, and hanizam@utem.edu.my. The Effect of Pulse DC and DC Substrate Bias During in Situ Cleaning PVD Process On Surface Roughness. Malaysian Technical Universities Network (MTUN), 2013.
警告：這些引文格式不一定是100％准確.