Longitudinal and polar MOKE magnetometry of magnetoresistive cobalt thin films prepared by thermal evaporation
Cobalt films of thickness 21, 29 and 68 nm were prepared by thermal evaporation with a deposition rate around 0.3 nm/s. Their hysteresis loops from longitudinal and polar magneto-optic Kerr effect (MOKE) magnetometry differed from typical characteristics of uniaxial magnetic anisotropy but still ind...
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| 主要な著者: | , , |
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| フォーマット: | 論文 |
| 言語: | English |
| 出版事項: |
Universiti Kebangsaan Malaysia
2012
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| オンライン･アクセス: | http://journalarticle.ukm.my/4476/1/14%2520CSirisathitkul.pdf http://journalarticle.ukm.my/4476/ http://www.ukm.my/jsm/ |
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| 要約: | Cobalt films of thickness 21, 29 and 68 nm were prepared by thermal evaporation with a deposition rate around 0.3 nm/s. Their hysteresis loops from longitudinal and polar magneto-optic Kerr effect (MOKE) magnetometry differed from typical characteristics of uniaxial magnetic anisotropy but still indicated the preference of in-plane anisotropy over perpendicular anisotropy. The longitudinal hysteresis loop of the 68 nm-thick film was decidedly in a transcritical state signified by an enhanced coercive field. Changing the angle (θ) between the 2500 Oe-magnetic field and the current gave rise to the change in electrical resistance (Rθ) of 29 nm-thick film and the plot between Rθ and cos2θ could be linearly fitted. The changes in resistance due to this anisotropic magnetoresistance (AMR) effect ranged from -0.08 % (θ = 90º) to +0.04 % (θ = 0º). |
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